micro resist technology

1.Photoresists and special photopolymers
2. Polymers for nanotechnology, DUV and electron beam resists
3. Polymers for nanoimprint lithography
4. Nano imprint material for PSS process
5. Photoresists and photopolymers for UV, laser and X-ray lithography
6. Material for VGA lens

micro resist technology was founded in 1993 by scientists and engineers with many years of experience in basic research and industrial application in the field of photochemistry, and the development and production of semiconductor technologies for optoelektronics, electonics, devices and storage circuits.
In October 1997 the quality management system of

micro resist technology was DIN EN ISO 9001 certified.

micro resist technology develops and produces special photoresists suitable for microelectronics and micromachining / microelectromechanical systems as well as for large area patterning and electoplating processes. Special care is taken of the strict requirements of micromachining and environmental impact in both manufacturing and application of the products.

Our success is based on continuous product development starting with basic components and the implementation of recent innovations. Our experience and close co-operation with scientific partners are the basis of our success. We can rely on the expertise and experience of our employees.

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